E-Beam Evaporation & Ion Assisted System

The E-beam Evaporation & Ion-Assisted System is completely customizable; the chamber can be designed to accept additional PVD sources. Unused ports are blocked with flanges to allow later additions.

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  • Electro-Polished Stainless Steel Chamber (D-Shaped Box)
  • 4” Diameter View Port on Front Door with Manual Shutter
  • Single / Multi pocket E-Beam Source with Water Cooled Crucible (4cc up to 75cc) with Individual Shutter
  • High Voltage Power Supply (3kW to 15 kW) with X-Y Sweep Controller
  • Turbo Molecular Vacuum Pumping System with Matching Dual Stage Rotary Vane Pump
  • Quartz Crystal Thickness Sensor with Deposition Controller
  • Full Range Vacuum Gauge with Digital Display & Readout
  • Ion Beam Assisted Deposition with Divergent Beam Ion Source & Power Supply
  • 115mm Substrate Stage
  • Semi-Automatic Controlled System


  • Water Chiller
  • Load Locked System with Sample Transfer Adaptability
  • Multi-Axis Substrate Stage Rotation
  • Quartz Lamp Heater (from 300° C up to 800° C)
  • Planetary Substrate Stage
  • Motorized Shutter Assembly
  • PLC Controlled System
  • PC Controlled System
  • Water Cooled Substrate Stage
  • Adjustable Size & Height Available for Substrate Stage
  • SQC 310 Film Thickness Monitor & Deposition Controller
  • In-Situ Mask Change
  • Large Capacity Crucible & Power Supply
  • Dry Scroll Pump
  • Cryo Pumping System
  • Cold Cathode or Hot Cathode Ionization Gauge
  • Additional Spare Flanges for Future Upgrades