Gas Source Deposition Technique

Atomic Layer Deposition System (ALD Series)

CVD & PECVD Systems

PECVD & CVD Systems

Plasma Enhanced Chemical Vapor Deposition, PECVD, is a type of Chemical Vapor Deposition, CVD, in which the chemical reaction is induced by RF power energy either with capacitive coupling or inductive coupling electrodes. There are many variations of PECVD systems with heated substrates, and varying pressure ranges.  The RF frequency normally employed in PECVD is 13.56 MHz

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