Physical Vapor Deposition
Ion beam deposition (IBD) is a vacuum deposition process that uses a broad beam ion source directly focused on a sputtering target. Sputtered material from the target then deposits on a nearby substrate, creating a thin film. Some applications will use an assembly of sputter targets that can be indexed to create multilayer thin films. Most IBD applications will use a second ion source, IBAD, to control and enhance the properties of the sputtered film.