E-Beam & Thermal Evaporation System

Torr’s Electron Beam Deposition system is a practical and highly reliable system. The EB-4P systems have four pocket crucibles varying in volume and a variety of power sources. 

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  • Electro-Polished Stainless Steel Chamber (D-shaped Box)
  • 4” Diameter View Port on Front Door with Manual Shutter
  • Single/Multi Pocket E-beam Sources with Water Cooled Crucible (4cc up to 75cc)
  • High Voltage Power Supply (3kW to 15 kW) with X-Y Sweep Controller
  • Turbo Molecular Vacuum Pumping System with Matching Dual Stage Rotary Vane Pump
  • Quartz Crystal Thickness Sensor with Deposition Controller
  • Full Range Vacuum Gauge with Digital Display & Readout
  • Two Resistive Thermal Sources with Individual Shutters
  • PLC Controlled System


  • Water Chiller
  • Load Lock System with Sample Transfer Adaptability
  • Multi-Axis Substrate Stage Rotation
  • Quartz Lamp Heater (from 300° C Up To 800 ° C)
  • Planetary Substrate Stage
  • PC Controlled System
  • Water Cooled Substrate Stage
  • SQC 310 Film Thickness Monitor & Deposition Controller
  • Motorized Shutter Assembly
  • Large Capacity Crucible & Power Supply
  • Dry Scroll Pump
  • Cryo Pumping System
  • Cold Cathode or Hot Cathode Ionization Gauge
  • Adjustable Size & Height Available for Substrate Stage
  • Additional Spare Flanges for Future Upgrades
  • Mass Flow Controller with Digital Readout
  • RF Cleaning Capability
  • In Situ Mask Changer