Plasma Etching

Reactive Ion Etching System (RIE Series)

Reactive Ion Etcher System

Torr International Inc. manufactures Reactive Ion Etchers designed for etching films of oxides, nitrides, polymers and more. Our standard RIE Series Plasma Etching System accommodates wafers/samples of up to 200mm diameter . Our custom RIE systems can handle variety of sample sizes based on geometry and research Needs.

Inductively Coupled Reactive Ion Etching System (ICPRIE Series)

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