Reactive Ion Etcher System
Torr International Inc. manufactures Reactive Ion Etchers designed for etching films of oxides, nitrides, polymers and more. Our standard RIE Series Plasma Etching System accommodates wafers/samples of up to 200mm diameter . Our custom RIE systems can handle variety of sample sizes based on geometry and research Needs.
Reactive Ion Etchers can be manually or PC controlled, and can be table-top or stand-alone cabinet systems.
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