Ion Beam Depositon System
Ion beam deposition (IBD) is a vacuum deposition process that uses a broad beam ion source directly focused on a sputtering target. Sputtered material from the target then deposits on a nearby substrate, creating a thin film. Some applications will use an assembly of sputter targets that can be indexed to create multilayer thin films. Most IBD applications will use a second ion source, IBAD, to control and enhance the properties of the sputtered film.
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