Ion Beam Depositon System

Ion beam deposition (IBD) is a vacuum deposition process that uses a broad beam ion source directly focused on a sputtering target. Sputtered material from the target then deposits on a nearby substrate, creating a thin film. Some applications will use an assembly of sputter targets that can be indexed to create multilayer thin films. Most IBD applications will use a second ion source, IBAD, to control and enhance the properties of the sputtered film.

Click link above to download PDF file.
To view 3D images in this PDF, please open file in Adobe Reader...         

  • Electro-Polished Stainless Steel Chamber (D-Shaped Box)
  • 4” Diameter View Port on Front Door with Manual Shutter
  • Turbo Molecular Vacuum Pumping System with Matching Dual Stage Rotary Vane Pump
  • Ion Beam Deposition with Convergent Beam Ion Source & Power Supply, with Easy Target Mounting Assembly
  • Ion Beam Assisted Deposition with Divergent Beam Ion Source & Power Supply
  • Quartz Crystal Thickness Sensor with Deposition Controller
  • Mass Flow Controller with Digital Readout
  • Full Range Vacuum Gauge with Digital Display & Readout
  • Semi-Automatic Controlled System
  • Water Chiller
  • Load Lock System with Sample Transfer Adaptability
  • Multi-Axis Substrate Stage Rotation Quartz Lamp Heater (from 300° C up to 800° C)
  • Planetary Substrate Stage
  • PLC Controlled System
  • PC Controlled System
  • Water Cooled Substrate Stage
  • Adjustable Size & Height Available for Substrate Stage
  • SQC 310 Film Thickness Monitor & Deposition Controller
  • Motorized Shutter Assembly
  • Dry Scroll Pump
  • Cryo Pumping System
  • Cold Cathode or Hot Cathode Ionization Gauge
  • Additional Spare Flanges for Future Upgrades
  • RF Cleaning/Biasing Capability
  • In Situ Mask Changer