Magnetron Sputtering System

The Torr International's MagSput™ series, the next generation Magnetron Sputtering Deposition system, is practical, inexpensive, expandable and highly reliable, ushering in the future of research.

The Magnetron Sputtering System is completely customizable. The chamber can be designed to accept additional evaporation sources, and unused ports are blocked off with flanges to allow future additions.

Additions can include Magnetron Guns, a Thermal Resistance source or Electron Beam Evaporation. Torr International can produce any custom system you desire. Call to discuss the functionality you require and a system will be designed to fit your process, your budget, and your future.


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The MagSput™ series Sputtering Systems are flexible planar magnetron sputtering systems designed specifically for R&D and prototype production. The system can be used to develop the deposition process for a variety of applications, including multi-layer optical coatings, sensor devices, solar cells, fuel cells, thin film research, superconductor research, ASICs, MEMs, magnetic devices & biomedical research.

Since targets can be changed quickly, the MagSput™ series system is easily reconfigured for applications requiring a different series of deposited materials. The system processes wafers up to 12 inches in diameter and accommodates odd-size substrates. Also, because of multi-gun capability, co-sputtering, sequential sputtering without breaking vacuum and reactive sputtering (with active gas mixtures) are possible. The stand-alone guns with special mounting enable angular adjustment.

The Labview™-based software brings state-of-the-art user-friendly computer control to the MagSput™ sputtering realm. The software's automatic process control ensures a more efficient deposition as well as ease of operation. The manual option enables easy start-up and troubleshooting.


  • Electro Polished Stainless Steel Chamber (D shaped Box)
  • 4” Diameter View Port on Front Door with Manual Shutter
  • Single/Multiple Magnetron Gun Assemblies with Various Target Sizes
  • Manual Shutter Assembly for All Sources
  • DC / RF Sputtering Deposition
  • Turbo Molecular Vacuum Pumping System with Matching Dual Stage Rotary Vane Pump
  • Quartz Crystal Thickness Sensor with Deposition Controller
  • Mass Flow Controller with Digital Readout
  • Full Range Vacuum Gauge with Display & Readout
  • Easy Target Mounting
  • Semi-Automatic Controlled System


  • Water Chiller
  • Substrate Pre-Cleaning
  • Load Lock Subsystem with Sample Transfer Adaptability
  • Multi-Axis Substrate Stage Rotation
  • Quartz Lamp Heater (from 300° C up to 800° C)
  • Planetary Substrate Stage
  • PLC Controlled System
  • PC Controlled System
  • Water Cooled Substrate Stage
  • Adjustable Size & Height Available for Substrate Stage
  • SQC 310 Film Thickness Monitor & Deposition Controller
  • Motorized Shutter Assembly
  • Dry Scroll Pump
  • Cryo Pumping System
  • Cold Cathode or Hot Cathode Ionization Gauge
  • Additional Spare Flanges for Future Upgrades