Electron Beam Evaporation System

Torr’s Electron Beam Deposition system is a practical and highly reliable system. The EB-4P systems have four pocket crucibles varying in volume and a variety of power sources.

The E-Beam Evaporation System is completely customizable; the chamber can be designed to accept additional PVD sources. Unused ports are blocked with flanges to allow later additions. When you are ready, you can add a thermal resistance source or DC & RF sputtering or etching.


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Torr EB-4P systems are ideal for depositing metals, oxides, magnetic materials and dielectrics in applications such as nanotechnology, optics, microscopy, MBE, functional and decorative coatings.

Our EB-4P series E-beam systems are specially tailored for laboratory or research and development, pilot production, university research or small-scale production. Their compact construction makes them ideal for clean room applications.

Torr E-beam systems produce uniform, adherent thin films of many materials. E-beam evaporation produces excellent rate control deposition with low contamination and includes multiple-axis rotation capability for the best uniformity possible on any size or shape sample.


  • Electro-Polished Stainless Steel Chamber (D-shaped box)
  • 4” Diameter View Port on Front Door with Manual Shutter
  • Single/Multi pocket E-Beam Sources with Water Cooled Crucible (from 4cc up to 75cc)
  • High Voltage Power Supply (3kW to 15 kW) with X-Y Sweep Controller
  • Turbo Molecular Vacuum Pumping System with Matching Dual Stage
  • Rotary Vane Pump
  • Quartz Crystal Thickness Sensor with Deposition Controller
  • Full Range Vacuum Gauge with Digital Display and Readout
  • Semi-Automatic Controlled System


  • Water Chiller
  • Load Lock System with Sample Transfer Adaptability
  • Multi-Axis Substrate Stage Rotation
  • Quartz Lamp Heater (from 300° C up to 800° C)
  • Planetary Substrate Stage
  • PLC Controlled System
  • PC Controlled System
  • Water Cooled Substrate Stage
  • SQC 310 Film Thickness Monitor & Deposition Controller
  • Motorized Shutter Assembly
  • Large Capacity Crucible & Power Supply
  • Dry Scroll Pump
  • Cryo Pumping System
  • Cold or Hot Cathode Ionization Gauge
  • Adjustable Size & Height Available for Substrate Stage
  • Additional Spare Flanges for Future Upgrades
  • Mass Flow Controller with Digital Readout
  • RF Cleaning Capability
  • In Situ Mask Changer