Refurbished Combinational Deposition System
The system proposed herein is a Combination Deposition System that includes Electron Beam Evaporation, Thermal Evaporation with Ion Beam Assisted Deposition sources. The chamber can accommodate up to 4”/6” diameter substrates and allows a combination of Thermal Evaporation and Electron Beam techniques to be performed without breaking vacuum. The pumping system includes Cryo based pump roughed by a Dual stage rotary pump.
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